In situ optimization of coupling from dielectric optical waveguides to semiconductor claddings

Recent interest in hybrid integrated optical devices has illustrated the need for comprehensive experimental studies of semiconductor-clad dielectric waveguides. Studies are needed which verify theoretical predictions of the unique periodic coupling versus cladding thickness which occur in semiconductor loaded dielectric waveguides. This dissertation presents experimental results obtained using in situ throughput measurements on semiconductor-clad dielectric waveguides. Specifically, attenuation as a function of cladding thickness is recorded as a semiconductor cladding is grown on, or etched from a dielectric waveguide. Materials used for the semiconductor claddings are hydrogenated amorphous silicon and hydrogenated amorphous germanium. Experimental results are compared with planar waveguide predictions and discrepancies are discussed.

Measurements of high attenuation in claddings of discrete thicknesses using photothermal deflection methods are performed. The results of the measurements are presented. An investigation of two high extinction ratio, integrated optical polarizers is also performed.

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Digitization of this thesis was made possible by a generous grant from the Jefferson Trust, 2015.

Thesis originally deposited on 2016-03-14 in version 1.28 of Libra. This thesis was migrated to Libra2 on 2017-03-23 16:34:50.